Other articles related with "critical dimension":
50601 Fang Wang(王芳), Yushu Shi(施玉书), Wei Li(李伟), Xiao Deng(邓晓), Xinbin Cheng(程鑫彬), Shu Zhang(张树), and Xixi Yu(余茜茜)
  Characterization of a nano line width reference material based on metrological scanning electron microscope
    Chin. Phys. B   2022 Vol.31 (5): 50601-050601 [Abstract] (328) [HTML 0 KB] [PDF 5236 KB] (114)
30601 Ziruo Wu(吴子若), Yanni Cai(蔡燕妮), Xingrui Wang(王星睿), Longfei Zhang(张龙飞), Xiao Deng(邓晓), Xinbin Cheng(程鑫彬), Tongbao Li(李同保)
  Amorphous Si critical dimension structures with direct Si lattice calibration
    Chin. Phys. B   2019 Vol.28 (3): 30601-030601 [Abstract] (659) [HTML 1 KB] [PDF 3718 KB] (146)
84201 Chen De-Liang (陈德良), Cao Yi-Ping (曹益平), Huang Zhen-Fen (黄振芬), Lu Xi (卢熙), Zhai Ai-Ping (翟爱平 )
  Optimum design of photoresist thickness for 90-nm critical dimension based on ArF laser lithography
    Chin. Phys. B   2012 Vol.21 (8): 84201-084201 [Abstract] (1289) [HTML 1 KB] [PDF 751 KB] (1801)
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